Horan, Ken (2012) Investigations of ultra shallow junction ion implanted biaxial tensile strained silicon by means of X-Ray, Raman and photoacoustic techniques. PhD thesis, Dublin City University.

Horan, Ken, Lankinen, Aapo, O'Reilly, Lisa, Bennett, N.S., McNally, Patrick J. ORCID: 0000-0003-2798-5121, Sealy, B.J., Cowern, N.E.B. and Tuomi, Tiinamaija (2008) Structural and electrical characterisation of ion-implanted strained silicon. Materials Science and Engineering: B, 154-15 . pp. 118-121. ISSN 0921-5107

O'Reilly, Lisa, Horan, Ken, McNally, Patrick J. ORCID: 0000-0003-2798-5121, Bennett, N.S., Cowern, N.E.B., Lankinen, Aapo, Sealy, B.J., Gwilliam, R.M., Noakes, T.C.Q. and Bailey, P. (2008) Constraints on micro-Raman strain metrology for highly doped strained Si materials. Applied Physics Letters, 92 (23). ISSN 1077-3118