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Control and enhancement of the oxygen storage capacity of ceria films by variation of the deposition gas atmosphere during pulsed D.C. magnetron sputtering

Eltayeb, Asmaa, Vijayaraghavan, Rajani K. orcid logoORCID: 0000-0003-1096-448X, McCoy, Anthony, Venkatanarayanan, Anita, Yaremchenko, Aleksey A., Surendran, Rajesh, McGlynn, Enda orcid logoORCID: 0000-0002-3412-9035 and Daniels, Stephen (2015) Control and enhancement of the oxygen storage capacity of ceria films by variation of the deposition gas atmosphere during pulsed D.C. magnetron sputtering. Journal of Power Sources, 279 . pp. 94-99. ISSN 0378-7753

Abstract
In this study, nanostructured ceria (CeO2) films are deposited on Si(100) and ITO coated glass substrates by pulsed DC magnetron sputtering using a CeO2 target. The influence on the films of using various gas ambients, such as a high purity Ar and a gas mixture of high purity Ar and O2, in the sputtering chamber during deposition are studied. The film compositions are studied using XPS and SIMS. These spectra show a phase transition from cubic CeO2 to hexagonal Ce2O3 due to the sputtering process. This is related to the transformation of Ce4+ to Ce3+ and indicates a chemically reduced state of CeO2 due to the formation of oxygen vacancies. TGA and electrochemical cyclic voltammetry (CV) studies show that films deposited in an Ar atmosphere have a higher oxygen storage capacity (OSC) compared to films deposited in the presence of O2. CV results specifically show a linear variation with scan rate of the anodic peak currents for both films and the double layer capacitance values for films deposited in Ar/O2 mixed and Ar atmosphere are (1.6 ± 0.2) x 10-4 F and (4.3 ± 0.5) x 10-4 F, respectively. Also, TGA data shows that Ar sputtered samples have a tendency to greater oxygen losses upon reduction compared to the films sputtered in an Ar/O2 mixed atmosphere.
Metadata
Item Type:Article (Published)
Refereed:Yes
Uncontrolled Keywords:Ceria; CeO2
Subjects:Engineering > Materials
Physical Sciences > Spectrum analysis
Physical Sciences > Chemistry
Physical Sciences > Semiconductors
DCU Faculties and Centres:Research Initiatives and Centres > National Centre for Plasma Science and Technology (NCPST)
DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Publisher:Elsevier
Official URL:http://dx.doi.org/10.1016/j.jpowsour.2014.12.146
Copyright Information:© 2015 Elsevier
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
ID Code:20395
Deposited On:22 Jan 2015 11:39 by Enda Mcglynn . Last Modified 09 Jun 2020 16:08
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