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Study of exciton-polariton modes in nanocrystalline thin films of CuCl using reflectance spectroscopy

Foy, Barry, McGlynn, Enda orcid logoORCID: 0000-0002-3412-9035, Cowley, Aidan, McNally, Patrick J. orcid logoORCID: 0000-0003-2798-5121 and Henry, Martin O. (2012) Study of exciton-polariton modes in nanocrystalline thin films of CuCl using reflectance spectroscopy. Journal of Applied Physics, 112 . 033505-033505. ISSN 1089-7550

Abstract
CuCl thin films grown on (100) Si by thermal evaporation are studied using reflectance spectroscopy. The reflectance spectra in the near UV spectral range close to the CuCl bandgap are modeled using a dielectric response function based on an exciton-polariton response with various models involving dead layers and reflected waves in the thin film. The exciton-polariton structure obtained is compared to other studies of bulk CuCl crystals. These different models are analyzed using a matrix-based approach and they yield theoretical spectra of reflected intensity. The fits provide parameter values which can be compared to bulk data known for CuCl and provide a non-destructive means of quantitative analysis of CuCl thin films. The best models are shown to match the experimental data quite well, with the closest fits produced when thin film front and rear interfaces are included. This model also accurately simulates the Fabry-Perot fringes present at energies lower than the Z3 free exciton position in CuCl (at 3.272 eV).
Metadata
Item Type:Article (Published)
Refereed:Yes
Subjects:Engineering > Materials
Physical Sciences > Nanotechnology
Physical Sciences > Photonics
Physical Sciences > Semiconductors
DCU Faculties and Centres:Research Initiatives and Centres > National Centre for Plasma Science and Technology (NCPST)
DCU Faculties and Schools > Faculty of Science and Health > School of Physical Sciences
Publisher:American Institute of Physics
Official URL:http://dx.doi.org/10.1063/1.4739726
Copyright Information:© 2012 AIP
Use License:This item is licensed under a Creative Commons Attribution-NonCommercial-Share Alike 3.0 License. View License
ID Code:19622
Deposited On:06 Nov 2013 16:30 by Enda Mcglynn . Last Modified 09 May 2019 10:15
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