The Standard Clean (SC-1) solution, which contains a mixture of hydrogen peroxide (H2O2), ammonium hydroxide (NH4OH) and water, makes up the most important part in the RCA cleaning process for semiconductor wafers. This step has proven to be the most effective method for the removal of contaminants. The SC-1 solution is, however, very unstable due to the decomposition of H2O2 and the evaporation of NH4OH. This work aims to use a combination of Raman spectroscopy and chemometrics in order to predict the concentrations of the individual components of unknown samples of SC-1. The attraction of such a technique is that it is non-invasive and therefore can be performed on-line. The potential cost-savings for semiconductor manufacturers are also considerable. Both calibration and prediction sets were obtained for various concentrations of SC-1 solutions. The results of the analyses performed are presented here.